CMOS Digital Integrated Circuits Analysis & Design by Sung-Mo (Steve) Kang, Yusuf Leblebici, Chul Woo Kim PDF

By Sung-Mo (Steve) Kang, Yusuf Leblebici, Chul Woo Kim

ISBN-10: 0072460539

ISBN-13: 9780072460537

CMOS electronic built-in Circuits: research and layout is the main entire e-book out there for CMOS circuits. acceptable for electric engineering and desktop technology, this booklet begins with CMOS processing, after which covers MOS transistor types, easy CMOS gates, interconnect results, dynamic circuits, reminiscence circuits, BiCMOS circuits, I/O circuits, VLSI layout methodologies, low-power layout strategies, layout for manufacturability and layout for testability. This publication presents rigorous remedy of easy layout innovations with distinct examples. It in general addresses either the computer-aided research matters and the layout matters for many of the circuit examples. a variety of SPICE simulation effects also are supplied for representation of simple suggestions. via rigorous research of CMOS circuits during this textual content, scholars might be capable of examine the basics of CMOS VLSI layout, that is the motive force in the back of the improvement of complex laptop undefined.

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4. Process flow for the fabrication of an n-type MOS transistor (continued). 27 Fabrication of MOSFETs 28 CHAPTER 2 Metal (Al) 102 (Oxide), I ... 4. Process flow for the fabrication of an n-type MOS transistor (continued). third) layer of metallic interconnect can also be added on top of this structure by creating another insulating oxide layer, cutting contact (via) holes, depositing, and patterning the metal. The major process steps for the fabrication of an nMOS transistor on p-type silicon substrate are also illustrated in Plate 1 and Plate 2.

How about the opposite case in which the process control is based on the largest window? 7 Photolithography has been the driving force behind massive processing of MOS chips at low cost. Despite significant improvements in both photolithography and photoresist materials, it has become increasingly more difficult to process very small, deep submicron feature sizes. Alternatives can be X-ray lithography or direct electron-beam writing. Discuss the difficulties inherent in such alternatives. 8 Consider a chip design using 10 mask levels.

The resulting cell layout is shown in Fig. 12. The new Vparasitics wii -Wfulladder layout occupies an area of (43 Atm x 90 gm) = 1290 ,um2 , which is about 14%b larger than the initial initiz layout (despite rather aggressive resizing of the transistor dimensions) )ns) but still below the th pre-set upper limit of 1500 ,um 2. 2 ns. 14 14 shows the signal propagation delay of both inputs during the same worst-casee input si transition depicted de in Fig. 11. 50%. The dynamic power dissipation of this circuit is estimated to be 460 AW.

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CMOS Digital Integrated Circuits Analysis & Design by Sung-Mo (Steve) Kang, Yusuf Leblebici, Chul Woo Kim


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